Conference was devoted to results of theoretical and experimental researches in the field of deposition of films and coverings by plasma and other related methods. The special attention was given to research methods of coverings' properties, new covering materials, including nanomaterials, new fields of their application, working out of the modern equipment and technological processes.

During conference work «ATC – Semiconductor Technologies and Equipment, JSC» presented the report «RUSSIAN ELECTRON BEAM EVAPORATION SYSTEMS. REALIZATION OF LOW OHMIC CONTACTS TO POWERFUL HEMT AND TRANSISTORS ON THE BASIS OF REFRACTORY MATERIALS».