Establishment of SemiTEq JSC by engineers from Ioffe Physical-Technical Institute of Russian Academy of Sciences

Deep modernization of Soviet molecular beam epitaxy (MBE) systems

Release of EPN3 MBE system for A3N compounds growth

Start of serial production STE3N MBE system for A3N compounds growth

Development and release of first plasma chemical etching and deposition (STE ICP), e-beam evaporation (STE EB) and rapid thermal annealing
(STE RTA) systems

Release of STE35 MBE system for A3B5 compounds growth

Release of first two-reactor STE3526 MBE system for hybrid nanoheterostructures A3B5/A2B6 compounds growth 

Foundation of Application Lab to develop the basic technological processes, demonstrate products capabilities and confirm its declared characteristics

First export supply of STE3N MBE system to Delhi, India

Release of versatile compact STE75 MBE system for A3B5, A2B6 and A3N compounds growth. Export supply to University of Toronto, Canada

Release of magnetron sputtering systems: STE MS150 for a wide range of R&D applications and STE MS900 for batch wafer processing

Release of upgraded STE35 MBE system for A3B5 compound growth on substrates up to Ø100mm with a new growth chamber design

Release of new generation of versatile platform for plasma chemical etching and deposition STE ICP200. Modernization of e-beam evaporation system STE EB71 and rapid thermal annealing system STE RTA100

Development of vacuum technological equipment set within the framework of the Union State of Russia and Belarus scientific and technical program

Release of new STE35R MBE platform combining up to 6 modules through robotic UHV cluster tool 

Release of upgraded STE ICP200 and STE MS900 systems with automated cassette wafer loading